Lithography makes a connection for nanowire devices

June 10, 2004 | Source: nanotechweb.org

Harvard University researchers have used a photolithography technique to set up interconnects to nanowire devices. The method uses a statistical approach to ensure that a high proportion of the nanowires connects to the electrodes — there is no need to link the two components individually.

“We believe this is the first reported bottom-up assembly and device integration approach that is fully scalable in terms of device density and area of coverage,: Song Jin and Dongmok Whang told nanotechweb.org. “It provides a pathway for the development of highly functional and integrated nanosystems.”