NTT Develops Three-Dimensional Nanofabrication Using Electron Beam Lithography

February 4, 2004 | Source: KurzweilAI

NTT has created an electron-beam lithography system that enables the fabrication of 3D structures down to the 10-nanometer level.

Plans call for applying this technique to nanofabrication of semiconductors and other nanoelectronic devices.

World's smallest globe, generated with NTT's new 3D EB lithography process, has a diameter of about 60 microns. The smallest pattern is about 10 nanometers in size, corresponding to 2 kilometers on the actual Earth.

World's smallest globe, generated with NTT's new 3D EB lithography process, has a diameter of about 60 microns. The smallest pattern is about 10 nanometers in size, corresponding to 2 kilometers on the actual Earth.

The process achieves a resolution 100 times that of conventional methods using an optical or X-ray beam, enabling fast 3D fabrication and patterning of nanoscale devices.

NTT press release