NTT Develops Three-Dimensional Nanofabrication Using Electron Beam Lithography
February 4, 2004 | Source: KurzweilAI
NTT has created an electron-beam lithography system that enables the fabrication of 3D structures down to the 10-nanometer level.
Plans call for applying this technique to nanofabrication of semiconductors and other nanoelectronic devices.
The process achieves a resolution 100 times that of conventional methods using an optical or X-ray beam, enabling fast 3D fabrication and patterning of nanoscale devices.