Advance in dip-pen nanolithography promises miniaturized gene chips, nanoscale electronics

September 27, 2006 | Source: KurzweilAI

Northwestern University researchers have developed a 55,000-pen, two-dimensional array that allows them to simultaneously create 55,000 identical patterns drawn with tiny dots of molecular ink on substrates of gold or glass. Each structure is only a single molecule tall.

The parallel process paves the way for making DPN competitive with other optical and stamping lithographic methods used for patterning large areas on metal and semiconductor substrates, including silicon wafers. The advantage of DPN, which is a maskless lithography, is that it can be used to deliver many different types of inks simultaneously to a surface in any configuration one desires. Mask-based lithographies and stamping protocols are extremely limited in this regard.

“This development should lead to massively miniaturized gene chips, combinatorial libraries for screening pharmaceutically active materials and new ways of fabricating and integrating nanoscale or even molecular-scale components for electronics and computers,” said Chad A. Mirkin, director of Northwestern’s International Institute for Nanotechnology and George B. Rathmann Professor of Chemistry, who led the research.

“In addition, it could lead to new ways of studying biological systems at the single particle level, which is important for understanding how cancer cells and viruses work and for getting them to stop what they do,” he said. “Essentially one can build an entire gene or protein chip that fits underneath a single cell.”

Source: Northwestern University news release