Evanescent wave litho to surface at SPIE
February 17, 2006 | Source: EE Times
The Rochester Institute of Technology (RIT) is expected to present a paper that claims it has produced a 26-nm image based on evanescent wave lithography (EWL).
This, in turn, opens EWL as an extension to conventional projection lithography as a means for sub-32-nm chip production, according to RIT.