Research removes major obstacle from mass production of tiny circuits
January 18, 2007 | Source: Physorg.com
A Princeton-led team has developed Nanoimprint, a form of nanoimprint lithography that uses a nanometer-scale mold to pattern computer chips and other nanostructures.
This technique allows for creation of circuits and devices with features not much longer than one nanometer — more than 10 times smaller than is possible in today’s mass-produced chips, yet more than 10 times cheaper.
Nanoimprinting: liquid droplets on the surface of a silicon wafer are pressed into a pattern, which quickly hardens to form the desired circuitry.