July 30, 2004
Princeton University researchers have shown that photocurable nanoimprint lithography (P-NIL) can produce lines of polymer resist just 7 nm wide with a pitch (or pattern repeat) of only 14 nm. The technique also produced reliable results over the whole area of a 4 inch wafer.
“This work really pushes the limit down to a few molecules in size,” said Stephen Chou of Princeton.
This is a 20-fold reduction… read more